The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11016874 B1

PDF
Full Text
Expired
Date of Patent:
May. 25, 2021

Filed:

Sep. 19, 2018
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Roee Hay, Singapore, SG;

Omer Tripp, Bronx, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 9/44 (2018.01); G06F 9/445 (2018.01); G06F 11/36 (2006.01); G06F 21/56 (2013.01);
U.S. Cl.
CPC ...
G06F 11/3612 (2013.01); G06F 9/44505 (2013.01); G06F 11/3692 (2013.01); G06F 21/566 (2013.01);
Abstract

An example system includes a processor to receive an application to be instrumented. The processor is to also instrument the application based on a baseline taint tracking scheme to generate an instrumented application including taint tags. The processor is also to execute the instrumented application and generate a profile of runtime behavior of the application. The processor is to modify the baseline tracking scheme based on the profile to generate an updated taint tracking scheme.


Find Patent Forward Citations

Hay, Roee. (2021). Updating taint tags based on runtime behavior profiles (U.S. Patent No. 11016874). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11016874

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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