The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 25, 2021

Filed:

May. 02, 2017
Applicant:

Arkema France, Colombes, FR;

Inventors:

Benoît Brule, Beaumont-le-Roger, FR;

Jérôme Amstutz, Charly, FR;

Guillaume Le, Herouvile Saint Clair, FR;

Julien Jouanneau, Corneville sur Risle, FR;

Assignee:

Arkema France, Colombes, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09D 11/102 (2014.01); B33Y 10/00 (2015.01); B33Y 70/00 (2020.01); B29C 64/153 (2017.01); C08G 65/40 (2006.01); C08G 65/46 (2006.01); C08L 71/00 (2006.01); C08G 8/02 (2006.01); B29K 71/00 (2006.01);
U.S. Cl.
CPC ...
C09D 11/102 (2013.01); B29C 64/153 (2017.08); B33Y 10/00 (2014.12); B33Y 70/00 (2014.12); C08G 8/02 (2013.01); C08G 65/4012 (2013.01); C08G 65/4093 (2013.01); C08G 65/46 (2013.01); C08L 71/00 (2013.01); B29K 2071/00 (2013.01); C08G 2650/40 (2013.01);
Abstract

Provided is a composition suitable for a process of building a three-dimensional object layer-by-layer by electromagnetic radiation-generated sintering, including at least one poly(aryl-ether-ketone) (PAEK), where the composition has an aromatic ether content of from 0 and 0.4% by mass, based on the total mass of the composition, and an aluminium mass content of lower than 1000 ppm. The composition may be used in process for building an object comprising sintering the composition with electromagnetic radiation. The present invention also includes a three-dimensional object obtained by such a process. A process for preparing the composition is also provided.


Find Patent Forward Citations

Loading…