The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 25, 2021

Filed:

Feb. 02, 2017
Applicant:

Showa Denko K.k., Tokyo, JP;

Inventors:

Mina Onishi, Tokyo, JP;

Tomokazu Sugawara, Tokyo, JP;

Assignee:

SHOWA DENKO K.K., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 222/10 (2006.01); C08F 220/10 (2006.01); C08F 2/40 (2006.01); C08F 2/46 (2006.01);
U.S. Cl.
CPC ...
C08F 222/1006 (2013.01); C08F 2/40 (2013.01); C08F 2/46 (2013.01); C08F 220/10 (2013.01); C08F 222/103 (2020.02); C08F 222/104 (2020.02); C08F 2800/20 (2013.01);
Abstract

There is provided an active energy ray-curable composition having excellent storage stability. The active energy ray-curable composition includes: active energy ray-curable compound (A) having an unsaturated ethylenic double bond; thiol compound (B) having two or more mercapto groups in one molecule; reaction inhibitor (C) configured to inhibit a reaction between the unsaturated ethylenic double bond and the mercapto groups; radical polymerization inhibitor (D); and water (E), wherein the content of water (E) is 0.05 ppm by mass or more and less than 1% by mass. When the total content of active energy ray-curable compound (A) and thiol compound (B) is 100 parts by mass, the content of reaction inhibitor (C) is 0.005 parts by mass or more and 10 parts by mass or less, and the content of radical polymerization inhibitor (D) is 0.005 parts by mass or more and 5 parts by mass or less.


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