The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 25, 2021
Filed:
Sep. 04, 2019
Seiko Epson Corporation, Tokyo, JP;
Eishin Yoshikawa, Nagano, JP;
Seiko Epson Corporation, Tokyo, JP;
Abstract
A test pattern formation method includes preparing a first pattern including a plurality of dot rows that are separated, and a second pattern including a plurality of regions having a width greater than a width of the plurality of dot rows and provided spaced apart by a plurality of gaps greater than or equal to the width of the plurality of dot rows. At least a portion of the first pattern and at least a portion of the second pattern are in positions overlapping each other. Given a largest overlap between one of the plurality of dot rows and one of the plurality of gaps as a reference, the other dot rows of the plurality of dot rows and the plurality of regions having a wide width overlap and are deviated from each other incrementally by a respective distance corresponding to a landing deviation amount.