The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 25, 2021

Filed:

Jan. 31, 2018
Applicant:

Space Systems/loral, Llc, Palo Alto, CA (US);

Inventors:

John Scott Higham, Mountain View, CA (US);

Gordon Wu, Lafayette, CO (US);

Daniel Andrew Fluitt, Santa Rosa, CA (US);

Elijah Zebadiah Gurnee, San Bruno, CA (US);

Jude Zils, Santa Cruz, CA (US);

Assignee:

Space Systems/Loral, LLC, Palo Alto, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29C 64/295 (2017.01); B29C 64/118 (2017.01); B29C 64/393 (2017.01); B33Y 10/00 (2015.01); B33Y 50/02 (2015.01); B64G 4/00 (2006.01); B64G 1/52 (2006.01); B33Y 30/00 (2015.01); B29K 101/12 (2006.01);
U.S. Cl.
CPC ...
B29C 64/295 (2017.08); B29C 64/118 (2017.08); B29C 64/393 (2017.08); B33Y 10/00 (2014.12); B33Y 30/00 (2014.12); B33Y 50/02 (2014.12); B64G 1/52 (2013.01); B64G 4/00 (2013.01); B29K 2101/12 (2013.01); B64G 2004/005 (2013.01);
Abstract

A spacecraft includes an additive manufacturing (A/M) subsystem and one or both of a thermal control arrangement and a contamination control arrangement. The A/M subsystem includes an A/M tool, feedstock and a workpiece and is configured to additively manufacture the workpiece using material from the feedstock. The thermal control arrangement is operable, in an on-orbit space environment characterized by near vacuum pressure and near zero-g force, to maintain temperature of at least one of the A/M tool, the feedstock, and the workpiece within respective specified ranges. The contamination control arrangement is operable, in the on-orbit space environment, to control outgassing of volatile organic compounds (VOCs).


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