The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 18, 2021

Filed:

Nov. 07, 2018
Applicants:

National Institute of Advanced Industrial Science and Technology, Tokyo, JP;

Design Network Co., Ltd., Tokyo, JP;

Inventors:

Shiro Hara, Ibaraki, JP;

Hitoshi Maekawa, Ibaraki, JP;

Hiroyuki Nishihara, Tokyo, JP;

Koji Sagisawa, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/677 (2006.01); H01L 21/673 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67766 (2013.01); H01L 21/6773 (2013.01); H01L 21/67379 (2013.01); H01L 21/67772 (2013.01); H01L 21/67775 (2013.01); H01L 21/68707 (2013.01);
Abstract

An automatic clamping mechanism capable of automatically securing and releasing a wafer transport container to or from a manufacturing apparatus and having a small height dimension is provided at low cost. A wafer transport container is placed on a container placing table. A semiconductor wafer is loaded into the manufacturing apparatus main body from a wafer loading port while being placed on a container base part of the wafer transport container. An automatic clamping mechanism generates a press force component in a vertical direction at the wafer transport container and secures the wafer transport container to the container placing table by bringing claw parts of a plurality of clamping claws into contact with an inclined contact surface provided on a container lid part of the wafer transport container and pressing the inclined contact surface in a substantially horizontal direction.


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