The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 18, 2021

Filed:

Nov. 30, 2018
Applicant:

Bellutech Llc, Ann Arbor, MI (US);

Inventors:

Weibin Zhu, Saline, MI (US);

Navid Yazdi, Ann Arbor, MI (US);

Assignee:

BelluTech LLC, Ann Arbor, MI (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01H 1/00 (2006.01); B81B 3/00 (2006.01); G01K 5/48 (2006.01); G01K 5/56 (2006.01); G01K 5/72 (2006.01); G01K 3/04 (2006.01);
U.S. Cl.
CPC ...
H01H 1/0036 (2013.01); B81B 3/0059 (2013.01); G01K 3/04 (2013.01); G01K 5/486 (2013.01); G01K 5/56 (2013.01); G01K 5/72 (2013.01); B81B 2201/0278 (2013.01); B81B 2201/0292 (2013.01); B81B 2201/032 (2013.01); B81B 2203/0118 (2013.01); H01H 2001/0078 (2013.01); H01H 2239/06 (2013.01);
Abstract

Sensors, systems, and methods for monitoring environmental conditions, such as physical, electromagnetic, thermal, and/or chemical parameters within an environment, over extended periods of time with the use of one or more electromechanical sensing devices and electronic circuitry for processing an output of the sensing devices. The sensing devices each include a cantilevered structure and at least one contact configured for contact-mode operation with the cantilevered structure in response to the cantilevered structure deflecting toward or away from the contact when exposed to the parameter of interest. The cantilevered structure has at least first and second beams of dissimilar materials, at least one of which has at least one property that changes as a result of exposure to the parameter.


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