The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 18, 2021
Filed:
May. 14, 2019
The Board of Trustees of the University of Illinois, Urbana, IL (US);
Kimani C. Toussaint, Champaign, IL (US);
Chukwuemeka O. Okoro, Quincy, MA (US);
THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLINOIS, Urbana, IL (US);
Abstract
The disclosure is directed to a method and apparatus for performing patterned microscopy. The method includes obtaining a microscopy image of an object based on optical signal from the object in response to a first incoming optical beam; and obtaining a contrast-enhancing image based on optical signal from the object in response to a second incoming optical beam. The method also includes generating a patterned mask based on the contrast-enhancing image. The method further includes applying the patterned mask on the microscopy image to obtain a patterned microscopy image. The microscopy image includes a polarization-analyzed reflection confocal microscopy image. The contrast-enhancing image includes a second-harmonic generation microscopy image. The patterned microscopy image includes a second-harmonic patterned polarization-analyzed reflection confocal microscopy image.