The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 18, 2021
Filed:
Sep. 21, 2018
Fujifilm Corporation, Tokyo, JP;
Shunsuke Kitajima, Haibara-gun, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
Provided are a photosensitive composition capable of forming a cured film having excellent adhesiveness and pattern forming properties, a color filter, a pattern forming method, a solid-state imaging device, and an image display device. The photosensitive composition includes a photopolymerization initiator I, a polymerizable monomer M having two or more groups having an ethylenically unsaturated double bond, and a halogenated zinc phthalocyanine, in which the polymerizable monomer M contains a polymerizable monomer Mhaving three groups having an ethylenically unsaturated double bond, the photopolymerization initiator I contains a photopolymerization initiator Ihaving a molar light absorption coefficient at a wavelength of 365 nm of 12,000 L·mol·cmor more, and the ratio of the mass of the photopolymerization initiator I to the mass of the polymerizable monomer M is 0.15 or less in terms of the mass of the photopolymerization initiator I/the mass of the polymerizable monomer M.