The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 18, 2021

Filed:

Apr. 14, 2020
Applicant:

Corning Incorporated, Corning, NY (US);

Inventors:

Brandon Allen Bazemore, Corning, NY (US);

Yuhui Jin, Painted Post, NY (US);

Jun Hou, Painted Post, NY (US);

Assignee:

Corning Incorporated, Corning, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/1335 (2006.01); C03C 15/00 (2006.01); C03C 23/00 (2006.01); G02B 5/02 (2006.01); C03C 3/091 (2006.01); C03C 3/087 (2006.01); C03C 3/085 (2006.01); C03C 21/00 (2006.01);
U.S. Cl.
CPC ...
G02F 1/133502 (2013.01); C03C 3/085 (2013.01); C03C 3/087 (2013.01); C03C 3/091 (2013.01); C03C 15/00 (2013.01); C03C 21/002 (2013.01); C03C 23/0075 (2013.01); G02B 5/0221 (2013.01); G02B 5/0294 (2013.01);
Abstract

Embodiments of anti-glare substrates and articles including the same are disclosed. In one or more embodiments, the anti-glares substrate includes a textured surface with a plurality of features having an average cross-sectional dimension of about 30 micrometers or less. The substrate or article exhibits a transmission haze of 10% or less, a PPDr of about 7% or less or 6% or less, and a DOI of about 80 or less. Method for forming the anti-glare substrates are also disclosed and include etching a surface of a substrate with an etchant having low water solubility to provide an etched surface, and removing a portion of the etched surface. The method includes generating a plurality of insoluble crystals (e.g., any one or more of KSiFand KAlF) on the surface while etching the surface. The etchant may include a potassium salt, an organic solvent and a fluoride containing acid.


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