The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 18, 2021

Filed:

Aug. 31, 2018
Applicant:

Goji Limited, Hamilton, BM;

Inventors:

Yuval Ben Haim, Marlow, GB;

Sharon Hadad, Giv'ataim, IL;

Avner Libman, Holon, IL;

Igal Yaari, Palo Alto, CA (US);

Maksim Berezin, Netanya, IL;

Elliad Silcoff, Tel Aviv, IL;

Amichai Ron, Jerusalem, IL;

Assignee:

GOJI LIMITED, Hamilton, BM;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 22/00 (2006.01); H05B 6/70 (2006.01); H05B 6/64 (2006.01); G01N 27/00 (2006.01); G06F 15/00 (2006.01); G01N 27/04 (2006.01); H05B 6/68 (2006.01);
U.S. Cl.
CPC ...
G01N 22/00 (2013.01); G01N 27/00 (2013.01); G01N 27/04 (2013.01); G06F 15/00 (2013.01); H05B 6/6441 (2013.01); H05B 6/6467 (2013.01); H05B 6/6473 (2013.01); H05B 6/6482 (2013.01); H05B 6/6485 (2013.01); H05B 6/688 (2013.01); H05B 6/705 (2013.01); Y02B 40/00 (2013.01);
Abstract

Apparatus and method for applying RF energy to determine a processing state of an object placed in a cavity, during processing of the object. The method includes applying RF energy to the object during the processing via at least one radiating element, receiving RF feedback from in or around the cavity, said RF feedback being indicative of a dielectric response of the cavity and/or the object to electromagnetic (EM) fields excited in the cavity, mathematically manipulating the RF feedback to obtain computed RF feedback, determining one or more processing states of the object based on a correlation between the computed RF feedback and the one or more processing states of the object, and monitoring the computed RF feedback during the applying to monitor the one or more processing states of the object.


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