The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 18, 2021

Filed:

Apr. 10, 2017
Applicants:

L'air Liquide, Société Anonyme Pour L'etude ET L'exploitation Des Procédés Georges Claude, Paris, FR;

Ziyun Wang, Allen, TX (US);

Zhiwen Wan, Plano, TX (US);

Jean-marc Girard, Versailles, FR;

Inventors:

Ziyun Wang, Allen, TX (US);

Zhiwen Wan, Plano, TX (US);

Jean-Marc Girard, Versailles, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/18 (2006.01); C07F 7/28 (2006.01); C23C 16/455 (2006.01); C07F 17/00 (2006.01); C23C 16/40 (2006.01); C07F 7/00 (2006.01); C23C 16/08 (2006.01);
U.S. Cl.
CPC ...
C07F 7/28 (2013.01); C07F 7/00 (2013.01); C07F 17/00 (2013.01); C23C 16/08 (2013.01); C23C 16/18 (2013.01); C23C 16/40 (2013.01); C23C 16/405 (2013.01); C23C 16/45553 (2013.01); C23C 16/45536 (2013.01);
Abstract

Disclosed are methods of using Group 4 transition metal azatrane precursors to deposit Group 4 transition metal-containing films on one or more substrates via vapor deposition processes.


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