The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 11, 2021
Filed:
Aug. 06, 2018
Applicant:
National Chiao Tung University, Hsinchu, TW;
Inventors:
Jih-Perng Leu, Taipei, TW;
Jui-Min Chang, Taipei, TW;
Assignee:
National Chiao Tung University, Hsinchu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/26 (2006.01); H01J 37/32 (2006.01); G02B 5/28 (2006.01); C23C 16/34 (2006.01); C23C 16/509 (2006.01); G02C 7/10 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32082 (2013.01); C23C 16/26 (2013.01); C23C 16/347 (2013.01); C23C 16/509 (2013.01); G02B 5/287 (2013.01); G02C 7/107 (2013.01); H01J 2237/3321 (2013.01);
Abstract
A method of manufacturing an amorphous carbon thin film is provided. The method includes the following steps: providing a substrate in a reaction chamber; flowing a precursor and a carrier gas into the reaction chamber; and performing a PECVD method to deposit the amorphous carbon thin film on the substrate. Wherein, the precursor includes a compound having a C≡N functional group.