The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 11, 2021
Filed:
Sep. 15, 2017
Applicant:
Hitachi High-technologies Corporation, Tokyo, JP;
Inventors:
Asako Kaneko, Tokyo, JP;
Hisayuki Takasu, Tokyo, JP;
Assignee:
Hitachi High-Tech Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/20 (2006.01); H01J 37/28 (2006.01); H01J 37/08 (2006.01); H01J 37/09 (2006.01); H01J 37/31 (2006.01);
U.S. Cl.
CPC ...
H01J 37/20 (2013.01); H01J 37/08 (2013.01); H01J 37/09 (2013.01); H01J 37/28 (2013.01); H01J 37/31 (2013.01); H01J 2237/081 (2013.01); H01J 2237/20257 (2013.01);
Abstract
An object of the present invention is to provide a technique for reducing a phenomenon in which fine particles derived from a sample and bounced off by ion beam irradiation are reattached to an ion milling surface. An ion milling device of the invention includes an ion source which emits an ion beam, a chamber, a sample table in which a sample is placed in the chamber, and a shielding plate placed on the sample, and by having a magnet disposed in the chamber, reattachment of fine particles derived from the sample can be reduced.