The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 11, 2021

Filed:

Feb. 28, 2018
Applicant:

Luxembourg Institute of Science and Technology (List), Esch/Alzette, LU;

Inventors:

Olivier De Castro, Schifflange, LU;

Serge Della-Negra, Orsay, FR;

David Dowsett, Schuttrange, LU;

Tom Wirtz, Grevenmacher, LU;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/08 (2006.01); H01J 37/12 (2006.01); H01J 37/147 (2006.01); H01J 37/30 (2006.01);
U.S. Cl.
CPC ...
H01J 37/08 (2013.01); H01J 37/12 (2013.01); H01J 37/147 (2013.01); H01J 37/3007 (2013.01); H01J 2237/082 (2013.01); H01J 2237/1504 (2013.01); H01J 2237/31749 (2013.01);
Abstract

The invention provides an electron-impact ion source device having high brightness as compared to known Nier-type ion sources, while providing similar advantages in terms of flexibility of the generated ion species, for example. The ionization chamber of the device operates at high pressures and provides for a large number of interactions between the electron beam and the gas molecules.


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