The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 11, 2021

Filed:

May. 01, 2017
Applicant:

Vactronix Scientific, Llc, Fremont, CA (US);

Inventors:

Tianzong Xu, San Ramon, CA (US);

George Xinsheng Guo, Palo Alto, CA (US);

Oahn Nguyen, Union City, CA (US);

Assignee:

Vactronix Scientific, LLC, Fremont, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01J 23/02 (2006.01); C23C 14/35 (2006.01); H01J 37/34 (2006.01); C23C 14/56 (2006.01);
U.S. Cl.
CPC ...
H01J 23/02 (2013.01); C23C 14/35 (2013.01); C23C 14/566 (2013.01); H01J 37/342 (2013.01); H01J 37/3405 (2013.01); H01J 37/3417 (2013.01);
Abstract

An Inverted Cylindrical Magnetron (ICM) System and Methods of Use is disclosed herein generally comprising a co-axial central anode concentrically located within a first annular end anode and a second annular end anode; a process chamber including a top end and a bottom end in which the first annular end anode and the second annular end anode are coaxially disposed, whereby the first annular end anode, the second annular end anode, and the central anode form a 3-anode configuration to provide electric field uniformity, and the process chamber including a central annular space coupled to a tube insulator disposed about the central annular space wall; a cathode concentrically coupled to the tube insulator and a target; and a plurality of multi-zone electromagnets or hybrid electro-permanent magnets surrounding the exterior of the process chamber providing a tunable magnetic field.


Find Patent Forward Citations

Loading…