The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 11, 2021

Filed:

Aug. 03, 2020
Applicant:

Mentor Graphics Corporation, Wilsonville, OR (US);

Inventors:

Sherif Hany Riad Mohammed Mousa, Beaverton, OR (US);

Jea Woo Park, Tualatin, OR (US);

Michael White, Tigard, OR (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 30/392 (2020.01); H05K 3/00 (2006.01);
U.S. Cl.
CPC ...
G06F 30/392 (2020.01); H05K 3/0005 (2013.01);
Abstract

Systems and methods for layout analysis using unit cell properties. A method includes receiving a layout design and analyzing the layout design to identify unit cells in the layout design. The method includes designating points of interest each corresponding to a respective one of the unit cells and classifying the unit cells into a plurality of classifications using the points of interest and the corresponding properties. The method includes identifying unique patterns of the unit cells, and producing a reduced layout including the unique patterns of unit cells. The method includes performing layout processing on the reduced layout and propagating the process results from each of the unique patterns of unit cells in the reduced layout to other unit cells of the layout design having the same classification.


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