The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 11, 2021
Filed:
Mar. 16, 2018
Applicant:
Lg Chem, Ltd., Seoul, KR;
Inventors:
Assignee:
LG CHEM, LTD., Seoul, KR;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/033 (2006.01); G03F 7/004 (2006.01); G03F 7/20 (2006.01); C08L 25/18 (2006.01); C08L 9/06 (2006.01); C08L 33/14 (2006.01); C08F 220/20 (2006.01); C08F 220/30 (2006.01); G03F 7/039 (2006.01); C08F 220/40 (2006.01); C08K 5/41 (2006.01); C08K 5/17 (2006.01);
U.S. Cl.
CPC ...
G03F 7/033 (2013.01); C08F 220/20 (2013.01); C08F 220/30 (2013.01); C08F 220/40 (2013.01); C08L 9/06 (2013.01); C08L 25/18 (2013.01); C08L 33/14 (2013.01); G03F 7/0045 (2013.01); G03F 7/0392 (2013.01); G03F 7/0397 (2013.01); G03F 7/2059 (2013.01); C08K 5/17 (2013.01); C08K 5/41 (2013.01);
Abstract
The present invention relates to a positive photoresist composition including an acrylic resin including a repeat unit of a specific structure, and a photosensitive acid-generating compound, a photoresist pattern using the same, and a method for manufacturing a pattern.