The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 11, 2021
Filed:
Nov. 19, 2018
Applicant:
Cypre, Inc., San Francisco, CA (US);
Inventors:
Assignee:
CYPRE, INC., San Francisco, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01F 1/66 (2006.01); G03F 1/66 (2012.01); G03F 7/16 (2006.01); C12M 1/12 (2006.01); G03F 1/38 (2012.01); C12M 1/32 (2006.01); G03F 7/20 (2006.01); C12M 1/00 (2006.01); G03F 7/00 (2006.01); G03F 7/038 (2006.01);
U.S. Cl.
CPC ...
G03F 1/66 (2013.01); C12M 23/12 (2013.01); C12M 23/20 (2013.01); C12M 25/06 (2013.01); G03F 1/38 (2013.01); G03F 7/16 (2013.01); G03F 7/2002 (2013.01); G03F 7/0037 (2013.01); G03F 7/038 (2013.01);
Abstract
Devices and methods for the manipulation and handling of light blocking masks suitable for controlled illumination of the wells of multi-well test plates are described. Such controlled illumination can be used to generate simple or complex three dimensional forms within the wells when used in combination with suitable photoactivatable polymer or gel precursors. Light blocking masks of the inventive concept can include features that stabilize or grip a multiwell plate when in use. Such masks can have apertures having a fixed configuration, or can have apertures with transient or changeable configurations.