The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 11, 2021
Filed:
Mar. 12, 2020
Shanghai Jiao Tong University, Shanghai, CN;
SHANGHAI JIAO TONG UNIVERSITY, Shanghai, CN;
Abstract
The present invention discloses a photo-alignment apparatus that realizes a desirable distribution through a single exposure and a method of manufacturing an optical element. The photo-alignment apparatus comprises a light source, a linear polarization film, a pixelated electronic-control phase retarder, and a phase retardation plate; the light source is used to provide light for a exposure; the linear polarization film is configured to convert the light emitted by the light source into a linearly-polarized light having a polarization direction parallel to the direction of the transmission axis of the linear polarization film; the pixelated electronic-control phase retarder is configured to generate phase retardations distributed in a desirable pattern; and the phase retardation plate is used to generate a non-pixelated phase retardation. With this photo-alignment apparatus, a polarization distribution of a desirable pattern can be generated, and a corresponding alignment profile can be formed on a polarization sensitive medium.