The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 11, 2021
Filed:
Jul. 06, 2018
Nhk Spring Co., Ltd., Yokohama, JP;
Shigeki Ichimura, Yokohama, JP;
Kunikazu Takiwaki, Yokohama, JP;
Kunio Asobe, Yokohama, JP;
Hiroyuki Orito, Yokohama, JP;
Takaharu Matsuo, Yokohama, JP;
Kiyoshi Ota, Yokohama, JP;
Hitoshi Komatsu, Yokohama, JP;
Taiki Futamura, Yokohama, JP;
Toshiharu Sato, Yokohama, JP;
NHK SPRING Co., Ltd., Yokohama, JP;
Abstract
Provided is a foamed urethane containing a cushion material, the foamed urethane containing a hard segment and a soft segment, in which the foamed urethane is a reaction cured product formed using an isocyanate component of an MDI compound. In a first aspect, a spin-spin relaxation time (T2) of the hard segment in the foamed urethane is from 20 μsec to 40 μsec, and a volume abundance ratio of the hard segment is from 5% to 40%. In a second aspect, a foamed urethane includes: a first region in which T2 of the hard segment is from 30 μsec to 40 μsec, and a volume abundance ratio of the hard segment is from 10% to 40%, and a second region in which T2 of the hard segment is from 20 μsec to less than 30 μsec, and a volume abundance ratio of the hard segment is from 5% to 40% in a Hsolid-state pulse NMR measurement, and which is adjacent to the first region.