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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11000879 B1

PDFFull Text
Date of Patent:
May. 11, 2021

Filed:

May. 23, 2017

Method and apparatus for treating substrate

Applicant:

Semes Co., Ltd., Chungcheongnam-do, KR;

Inventor:

Byungsun Bang, Chungcheongnam-do, KR;

Assignee:

SEMES CO., LTD., Chungcheongnam-do, KR;

Attorney:

Li & Cai Intellectual Property (USA) Office

Primary Examiner:

Shamim Ahmed

Assistant Examiner:

Bradford M Gates

Int. Cl.
CPC ...
B05D 3/06 (2006.01); H01L 21/67 (2006.01); H01L 21/02 (2006.01); B05C 9/14 (2006.01); B05C 11/08 (2006.01); B05C 11/10 (2006.01); B05C 21/00 (2006.01); B05D 3/02 (2006.01); B05D 3/10 (2006.01); B05D 5/08 (2006.01); B05D 1/00 (2006.01);
U.S. Cl.
CPC ...
B05D 3/065 (2013.01); B05C 9/14 (2013.01); B05C 11/08 (2013.01); B05C 11/1002 (2013.01); B05C 21/00 (2013.01); B05D 3/0254 (2013.01); B05D 3/10 (2013.01); H01L 21/02057 (2013.01); H01L 21/67028 (2013.01); H01L 21/67051 (2013.01); H01L 21/67115 (2013.01); B05D 1/005 (2013.01); B05D 3/0218 (2013.01); B05D 3/067 (2013.01); B05D 3/104 (2013.01); B05D 5/08 (2013.01);
Abstract

Provided is a method and apparatus for treating a substrate with a liquid. The substrate treating method comprises a pre-treating step for supplying the treatment liquid containing hydrogen fluoride (HF) to the substrate and treating the substrate before the surface modification step and a surface modification step for supplying an alkene-based chemical onto a substrate to change the surface of the substrate to a hydrophobic state. As a result, the surface of the substrate is uniform, and generation of particles can be reduced when the substrate is removed.

Find Patent Forward Citations

Bang, Byungsun. (2021). Method and apparatus for treating substrate (U.S. Patent No. 11000879). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11000879

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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