The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 04, 2021

Filed:

Jun. 29, 2016
Applicant:

Smith & Nephew, Inc., Austin, TX (US);

Inventor:

Daniel B. Masse, Windham, NH (US);

Assignee:

Smith & Nephew, Inc., Austin, TX (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A61B 18/00 (2006.01); A61B 18/14 (2006.01); A61B 18/12 (2006.01);
U.S. Cl.
CPC ...
A61B 18/148 (2013.01); A61B 18/1206 (2013.01); A61B 18/1402 (2013.01); A61B 2018/00083 (2013.01); A61B 2018/00565 (2013.01); A61B 2018/00583 (2013.01); A61B 2018/00642 (2013.01); A61B 2018/00666 (2013.01); A61B 2018/00791 (2013.01); A61B 2018/00803 (2013.01); A61B 2018/00875 (2013.01); A61B 2018/126 (2013.01); A61B 2018/128 (2013.01); A61B 2218/007 (2013.01);
Abstract

A method is disclosed including immersing electrodes disposed on a distal end of an electrosurgical wand, the immersing in a cavity defined within walls of a first material, the cavity comprising a conductive fluid different than the first material, and the electrodes comprising a first electrode and a second electrode. The method further includes applying a voltage across the first electrode and the second electrode, the first and second electrode spaced apart on the distal end of the wand such that the conductive fluid resides between the first and second electrodes. The method further includes measuring an impedance of the conductive fluid between the first and second electrodes; and determining temperature of the conductive fluid based on the measured impedance. The method further includes forming plasma proximate to an active electrode distinct from the first and second electrode, the plasma created based on voltage applied to the active electrode.


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