The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 27, 2021
Filed:
Nov. 15, 2018
Applicants:
Foundation of Soongsil University-industry Cooperation, Seoul, KR;
Industry-university Cooperation Foundation Hanyang University, Seoul, KR;
Inventors:
Do Hwan Kim, Anyang-si, KR;
Hojin Lee, Seoul, KR;
Han Wool Park, Seoul, KR;
Keun-Yeong Choi, Seoul, KR;
Moon Sung Kang, Seoul, KR;
Haejung Hwang, Seoul, KR;
Ji Hye Shin, Seoul, KR;
Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 51/00 (2006.01); H01L 51/05 (2006.01); B01J 20/22 (2006.01);
U.S. Cl.
CPC ...
H01L 51/0084 (2013.01); B01J 20/226 (2013.01); H01L 51/009 (2013.01); H01L 51/0558 (2013.01); B01D 2253/204 (2013.01); H01L 51/0028 (2013.01); H01L 51/0094 (2013.01); H01L 51/0541 (2013.01);
Abstract
Disclosed are an organic semiconductor compound that exhibits chemical resistance and etch resistance while maintaining electrical characteristics and thus is applicable to an existing photolithography process, thereby increasing process efficiency, and an organic semiconductor device using the same.