The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 27, 2021
Filed:
Dec. 20, 2017
Samsung Electronics Co., Ltd., Suwon-si, KR;
Yong-Jhin Cho, Hwaseong-si, KR;
Young-Hoo Kim, Yongin-si, KR;
Jihoon Jeong, Suwon-si, KR;
Yungjun Kim, Seoul, KR;
Jung-Min Oh, Incheon, KR;
Kuntack Lee, Suwon-si, KR;
Hyosan Lee, Hwaseong-si, KR;
Abstract
A process chamber and a substrate processing apparatus including the same are disclosed. The process chamber includes a first housing and a second housing on the first housing. The first housing includes a first outer wall, a first partition wall facing the first outer wall, and a first side wall connecting the first outer wall and the first partition wall. The second housing includes a second outer wall, a second partition wall between the second outer wall and the first partition wall, and a second side wall connecting the second outer wall and the second partition wall. Each of the first and second outer walls has a thickness greater than a thickness of the first partition wall and a thickness of the second partition wall.