The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 27, 2021

Filed:

Jun. 21, 2019
Applicant:

SK Hynix Inc., Icheon-si, KR;

Inventors:

Hyeong Seok Choi, Seoul, KR;

Hyun Chul Seo, Yongin-si, KR;

Seang Hwan Kim, Icheon-si, KR;

Assignee:

SK hynix Inc., Icheon-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/48 (2006.01); H01L 21/66 (2006.01); H01L 23/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/485 (2013.01); H01L 22/20 (2013.01); H01L 24/81 (2013.01); H01L 2924/3511 (2013.01);
Abstract

A method of fabricating a semiconductor package may include forming a plating layer on a surface of a substrate body. A circuit resist pattern and a monitoring resist pattern may be formed on the plating layer, and the plating layer may be etched using the circuit resist pattern and the monitoring resist pattern as etch masks, thereby forming circuit patterns and sub-patterns of a monitoring pattern. A residual rate of the circuit patterns may be monitored by inspecting the number of the sub-patterns of the monitoring pattern remaining on the substrate body after an etch process for forming the circuit patterns and the sub-patterns of the monitoring pattern. A semiconductor chip may be bonded to the circuit patterns using inner connectors.


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