The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 27, 2021
Filed:
Oct. 09, 2019
Applicant:
Main Law Cafe, Hedgesville, WV (US);
Inventor:
Yuri Glukhoy, San Francisco, CA (US);
Assignee:
Other;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/3065 (2006.01); H01L 21/3213 (2006.01);
U.S. Cl.
CPC ...
H01L 21/30655 (2013.01); H01L 21/32137 (2013.01);
Abstract
A modified deposit-and-etch Bosch process of cyclic anisotropic etching and film deposition by gas switching. The modification of which includes depositing nucleated silicon layers as liquefied droplets of silicon instead of by passivation, and using a bias discharge to decelerate an otherwise ballistic deposition instead into a nuclei-generation cloud at the deposition site. Such is then useful in the refurbishment of gas distribution plates made of silicon.