The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 27, 2021
Filed:
Mar. 20, 2019
Applicant:
Kabushiki Kaisha Toshiba, Minato-ku, JP;
Inventors:
Mitsuo Sano, Yokohama, JP;
Keiichiro Matsuo, Yokohama, JP;
Susumu Obata, Yokohama, JP;
Kazuhito Higuchi, Yokohama, JP;
Kazuo Shimokawa, Yokohama, JP;
Assignee:
KABUSHIKI KAISHA TOSHIBA, Minato-ku, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A61K 9/14 (2006.01); B22F 9/00 (2006.01); C21B 15/04 (2006.01); C22B 5/20 (2006.01); C22C 1/04 (2006.01); H01L 21/306 (2006.01); H01L 21/308 (2006.01); H01L 21/033 (2006.01);
U.S. Cl.
CPC ...
H01L 21/30604 (2013.01); H01L 21/3085 (2013.01); H01L 21/0332 (2013.01); H01L 21/0335 (2013.01); H01L 21/0337 (2013.01);
Abstract
According to an embodiment, a method of forming a porous layer includes forming a porous layer containing a noble metal on a surface made of a semiconductor by displacement plating. The plating solution used in the displacement plating contains a noble metal source, hydrogen fluoride, and an adjusting agent adjusting a pH value or zeta potential. The noble metal source produces an ion containing the noble metal in water. The plating solution has a pH value in a range of 1 to 6.