The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 27, 2021

Filed:

May. 11, 2016
Applicant:

Hamamatsu Photonics K.k., Hamamatsu, JP;

Inventors:

Koyo Watanabe, Hamamatsu, JP;

Takashi Inoue, Hamamatsu, JP;

Koji Takahashi, Hamamatsu, JP;

Assignee:

HAMAMATSU PHOTONICS K.K., Hamamatsu, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/01 (2006.01); G02F 1/13 (2006.01); G02F 1/133 (2006.01);
U.S. Cl.
CPC ...
G02F 1/0121 (2013.01); G02F 1/13 (2013.01); G02F 1/133 (2013.01); G02F 2203/12 (2013.01); G02F 2203/18 (2013.01); G02F 2203/26 (2013.01); G02F 2203/50 (2013.01);
Abstract

A modulation pattern calculation apparatus includes an iterative Fourier transform unit, a filtering process unit, and a modulation pattern calculation unit. The iterative Fourier transform unit performs a Fourier transform on a waveform function including an intensity spectrum function and a phase spectrum function, performs a replacement of a temporal intensity waveform function based on a desired waveform after the Fourier transform and then performs an inverse Fourier transform, and performs a replacement to constrain the phase spectrum function after the inverse Fourier transform. The filtering process unit performs a filtering process of cutting a part exceeding a cutoff intensity for each wavelength, on the intensity spectrum function in a frequency domain.


Find Patent Forward Citations

Loading…