The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 27, 2021
Filed:
Jul. 05, 2007
Applicants:
Steven R. Chapman, Glenview, IL (US);
Kejian (Kevin) Huang, Buffalo Grove, IL (US);
Feng Wu, Lake Zurich, IL (US);
Inventors:
Steven R. Chapman, Glenview, IL (US);
Kejian (Kevin) Huang, Buffalo Grove, IL (US);
Feng Wu, Lake Zurich, IL (US);
Assignee:
Avery Dennison Corporation, Glendale, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 5/124 (2006.01); B29D 11/00 (2006.01);
U.S. Cl.
CPC ...
G02B 5/124 (2013.01); B29D 11/00605 (2013.01);
Abstract
A method of making an array () of aberrated optical elements (). The method comprises the steps of providing a substrate having a first surface with forming elements thereon, and controlled working a localized region on the first surface of the substrate. The controlled working is of a magnitude sufficient to aberrate one or more of the forming elements in an affected site surrounding the localized region.