The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 27, 2021
Filed:
Dec. 01, 2017
Fujifilm Corporation, Tokyo, JP;
Kentaro Toyooka, Shizuoka, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
Provided are a transparent electrode-attached complex which includes a base material, a transparent electrode pattern, an optical adjustment member, and a transparent protective layer in this order, in which the optical adjustment member has at least one layer of low-refractive index layers that are odd-numbered layers from a transparent electrode pattern side and at least one layer of high-refractive index layers that are even-numbered layers from the transparent electrode pattern side, a difference in refractive index between the low-refractive index layer and the high-refractive index layer that are directly adjacent to each other is 0.05 or more, a refractive index of the high-refractive index layer is 2.10 or lower, and a thickness of each of the low-refractive index layer and the high-refractive index layer is 5 to 80 nm, has excellent transparent electrode pattern-masking properties, is capable of reducing unevenness attributed to an optical adjustment member, and has an excellent pencil hardness even without using a transparent film having a high refractive index on the base material-side of a transparent electrode pattern; a transfer film; a method for manufacturing a transparent electrode-attached complex; and an electrostatic capacitance-type input device.