The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 27, 2021
Filed:
Dec. 14, 2017
Nanyang Technological University, Singapore, SG;
Auckland University of Technology, Auckland, NZ;
Paul M. E. Shutler, Singapore, SG;
Kevin Byard, Auckland, NZ;
Nanyang Technological University, Singapore, SG;
Auckland University of Technology, Auckland, NZ;
Abstract
A coded aperture mask is provided. The coded aperture mask may include a 2-D planar substrate having a plurality of holes constructed based on a Cartesian product of a first 1-D aperture set and a second 1-D aperture set. The first 1-D aperture set may have a first balanced decoder. The second 1-D aperture set may have a second balanced decoder. The Cartesian product may involve the first 1-D aperture set and the second 1-D aperture set arranged in a non-zero angle (e.g., 90 degrees) to each other. The first 1-D aperture set may define a first axis of the 2-D planar substrate. The second 1-D aperture set may define a second axis of the 2-D planar substrate. The plurality of holes on the 2-D planar substrate may correspond to holes in both of the first 1-D aperture set and the second 1-D aperture set.