The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 27, 2021
Filed:
Apr. 05, 2019
Applicant:
Zaiput Flow Technologies Llc, Waltham, MA (US);
Inventors:
Andrea Adamo, Cambridge, MA (US);
Robert Andrew Butters, Waltham, MA (US);
Trevor Charles Murray, Boston, MA (US);
Assignee:
Zaiput Flow Technologies LLC, Waltham, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01L 3/00 (2006.01); B01D 17/04 (2006.01); B01D 63/08 (2006.01);
U.S. Cl.
CPC ...
B01L 3/502769 (2013.01); B01D 17/04 (2013.01); B01D 63/087 (2013.01); B01D 63/088 (2013.01); B01L 2200/0673 (2013.01); B01L 2200/0684 (2013.01); B01L 2400/0487 (2013.01);
Abstract
Reservoir-based management of volumetric flow rates in fluidic systems is generally described. Inventive systems and methods for liquid-liquid separations and/or liquid-gas separations are also described.
Quick Actions:
Adamo, Andrea. (2021). Reservoir-based management of volumetric flow rate in fluidic systems (U.S. Patent No. 10987671). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10987671
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile