The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 20, 2021
Filed:
Sep. 10, 2019
Kymeta Corporation, Redmond, WA (US);
Tung Pham, Renton, WA (US);
Phillip Izdebski, Kirkland, WA (US);
Mikala C. Johnson, Seattle, WA (US);
Taylor Stokes, Monroe, WA (US);
Ryan A. Stevenson, Woodinville, WA (US);
Jacob Tyler Repp, Monroe, WA (US);
Michael Severson, Seattle, WA (US);
KYMETA CORPORATION, Redmond, CA (US);
Abstract
Monitoring and compensating for environmental and other conditions affecting antenna elements of an antenna is described. The conditions may affect radio frequency (RF) liquid crystal of the antenna elements. In one embodiment, the antenna comprises a physical antenna aperture having an array of surface scattering antenna elements that are controlled and operable together to form a beam for the frequency band for use in holographic beam steering and a compensation controller to perform compensation on the antenna elements based on monitored antenna conditions.