The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 20, 2021
Filed:
Jun. 14, 2017
Applicant:
Emberion Oy, Espoo, FI;
Inventor:
Alexander Bessonov, Cambridge, GB;
Assignee:
EMBERION OY, Espoo, FI;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 51/42 (2006.01); H01L 51/00 (2006.01); G03F 1/42 (2012.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); H01G 9/00 (2006.01); H01G 9/20 (2006.01); H01L 51/50 (2006.01); H01L 51/52 (2006.01);
U.S. Cl.
CPC ...
H01L 51/0018 (2013.01); G03F 1/42 (2013.01); G03F 7/162 (2013.01); G03F 7/2002 (2013.01); H01G 9/0036 (2013.01); H01G 9/2009 (2013.01); H01L 51/428 (2013.01); H01L 51/4253 (2013.01); H01L 51/5032 (2013.01); H01L 51/5296 (2013.01); H01L 51/0077 (2013.01);
Abstract
A method comprising: providing a substrate comprising one or more electronic structures; providing a layer of perovskite overlaying the one or more electronic structures; coating a layer of photoresist material overlaying the layer of perovskite; aligning a mask with the one or more electronic structures and patterning the photoresist material; and using the same etchant to remove sections of the patterned photoresist material and the perovskite underneath the sections of the photoresist material.