The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 20, 2021

Filed:

Sep. 27, 2018
Applicant:

Hitachi Metals, Ltd., Tokyo, JP;

Inventor:

Futoshi Kuniyoshi, Minato-ku, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01F 1/057 (2006.01); H01F 41/02 (2006.01); C22C 28/00 (2006.01); C22C 38/10 (2006.01); B22F 7/06 (2006.01); B22F 1/00 (2006.01); C22C 1/04 (2006.01); C22C 38/00 (2006.01);
U.S. Cl.
CPC ...
H01F 1/0577 (2013.01); B22F 1/0048 (2013.01); B22F 7/06 (2013.01); C22C 1/0491 (2013.01); C22C 28/00 (2013.01); C22C 38/005 (2013.01); C22C 38/10 (2013.01); H01F 41/0293 (2013.01); B22F 1/0085 (2013.01); B22F 2998/10 (2013.01);
Abstract

A method for producing a sintered R-T-B based magnet includes the steps of: providing a sintered R-T-B based magnet work; providing a Pr—Ga alloy powder produced through atomization; subjecting the Pr—Ga alloy powder to a heat treatment at a temperature which is not lower than a temperature that is 250° C. below a melting point of the Pr—Ga alloy powder and which is not higher than the melting point, to obtain a diffusion source from the Pr—Ga alloy powder; and placing the sintered R-T-B based magnet work and the diffusion source in a process chamber, and heating the sintered R-T-B based magnet work and the diffusion source in a vacuum or an inert gas ambient, thereby allowing Pr and Ga to diffuse from the diffusion source into the interior of sintered R-T-B based magnet work.


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