The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 20, 2021
Filed:
Mar. 21, 2019
National Taiwan Normal University, Taipei, TW;
Chau-Jern Cheng, Taipei, TW;
Han-Yen Tu, Taipei, TW;
Kuang-Che Chang Chien, New Taipei, TW;
Yu-Chih Lin, Taipei, TW;
NATIONAL TAIWAN NORMAL UNIVERSITY, Taipei, TW;
Abstract
A method for defect inspection of a transparent substrate comprises utilizing a wavefront reconstruction unit to obtain complex defect diffraction wavefront of a transparent substrate; using a complex defect diffraction module to confirm the effective diffraction distance of the complex defect diffraction wavefront; utilizing a defect detection module to detect position of the defect of the transparent substrate; using a defect classification module to perform extraction, analysis and classification of diffraction characteristics and utilizing a machine learning algorithm or a deep learning algorithm to automatically identify the defects.