IDiyas

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10983436 B1

PDFFull Text
Date of Patent:
Apr. 20, 2021

Filed:

Mar. 17, 2017

Negative-type photosensitive resin composition, cured film, display device provided with cured film, and production method therefor

Applicant:

Toray Industries, Inc., Tokyo, JP;

Inventors:

Yugo Tanigaki, Otsu, JP;

Satoshi Kamemoto, Otsu, JP;

Kazuto Miyoshi, Otsu, JP;

Assignee:

TORAY INDUSTRIES, INC., Tokyo, JP;

Attorney:

Birch, Stewart, Kolasch & Birch, LLP

Primary Examiner:

Chanceity N Robinson

Int. Cl.
CPC ...
G03F 7/32 (2006.01); G03F 7/038 (2006.01); G03F 7/075 (2006.01); G03F 7/037 (2006.01); G02F 1/1335 (2006.01); G02F 1/1339 (2006.01); G02F 1/1368 (2006.01); G03F 7/023 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/40 (2006.01); H01L 21/027 (2006.01); H01L 27/12 (2006.01); H01L 51/56 (2006.01); H01L 51/00 (2006.01); H01L 51/52 (2006.01); H01L 21/02 (2006.01); H01L 21/311 (2006.01); G02F 1/1362 (2006.01); H01L 27/32 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0387 (2013.01); G02F 1/1368 (2013.01); G02F 1/13394 (2013.01); G02F 1/133512 (2013.01); G03F 7/0236 (2013.01); G03F 7/037 (2013.01); G03F 7/038 (2013.01); G03F 7/0381 (2013.01); G03F 7/0385 (2013.01); G03F 7/0388 (2013.01); G03F 7/0757 (2013.01); G03F 7/16 (2013.01); G03F 7/168 (2013.01); G03F 7/2004 (2013.01); G03F 7/322 (2013.01); G03F 7/40 (2013.01); H01L 21/0274 (2013.01); H01L 27/1248 (2013.01); H01L 27/1288 (2013.01); H01L 51/56 (2013.01); G02F 1/13398 (2021.01); G02F 1/13625 (2021.01); G02F 1/136236 (2021.01); G02F 1/136286 (2013.01); G02F 1/136295 (2021.01); G02F 2202/023 (2013.01); H01L 21/02118 (2013.01); H01L 21/311 (2013.01); H01L 27/124 (2013.01); H01L 27/3246 (2013.01); H01L 27/3258 (2013.01); H01L 27/3276 (2013.01); H01L 51/0052 (2013.01); H01L 51/0058 (2013.01); H01L 51/0059 (2013.01); H01L 51/0072 (2013.01); H01L 51/0085 (2013.01); H01L 51/5284 (2013.01); H01L 2227/323 (2013.01);
Abstract

The present invention provides a negative type photosensitive resin composition having high sensitivity, excellent halftone characteristics, capability to form a small tapered pattern shape, and alkali-developability. The negative type photosensitive resin composition includes, as an alkali-soluble resin (A), at least a weakly acidic group-containing resin (A1) and an unsaturated group-containing resin (A2), the weakly acidic group-containing resin (A1) containing an acidic group having an acid dissociation constant in the range of 13.0 to 23.0 in dimethyl sulfoxide, and the unsaturated group-containing resin (A2) containing an ethylenically unsaturated double bond group.

Find Patent Forward Citations

Loading…