The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 20, 2021

Filed:

Dec. 03, 2018
Applicant:

Hitachi, Ltd., Tokyo, JP;

Inventors:

Takuya Kambayashi, Tokyo, JP;

Toshimitsu Noguchi, Tokyo, JP;

Shunsuke Kono, Tokyo, JP;

Assignee:

HITACHI, LTD., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/05 (2006.01); G01N 21/53 (2006.01); G01N 21/01 (2006.01);
U.S. Cl.
CPC ...
G01N 21/532 (2013.01); G01N 21/05 (2013.01); G01N 2021/0193 (2013.01); G01N 2021/052 (2013.01);
Abstract

To provide a reaction system capable of analyzing a liquid sample with high accuracy. To provide a reaction system A including: a reaction vessel, a flow channelincluding a deformable unithaving an elastic member, a pump, a flow channel deformation mechanism, a measurement unitand an analysis unit, wherein the measurement unitincludes a light source unitand a light receiving unit, the flow channel deformation mechanismincludes an operation unitfor deforming the deformable unitof the flow channelsuch that a cross-sectional area of the deformable unitis reduced, and the analysis unitis electrically or physically connected to the measurement unitand the flow channel deformation mechanism, and operates the flow channel deformation mechanismbased on a measurement result obtained by the measurement unit


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