The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 20, 2021
Filed:
Sep. 27, 2017
Applicant:
Dai Nippon Printing Co., Ltd., Tokyo, JP;
Inventors:
Assignee:
Dai Nippon Printing Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/04 (2006.01); C23C 16/44 (2006.01); H01L 27/32 (2006.01); H01L 51/50 (2006.01); H01L 51/00 (2006.01); C23C 16/04 (2006.01); H01L 51/56 (2006.01);
U.S. Cl.
CPC ...
C23C 14/042 (2013.01); C23C 16/042 (2013.01); C23C 16/44 (2013.01); H01L 27/3244 (2013.01); H01L 51/0011 (2013.01); H01L 51/5012 (2013.01); H01L 51/56 (2013.01);
Abstract
There is provided a vapor deposition mask including: a resin mask including a resin mask opening corresponding to a pattern to be produced by vapor deposition; and a metal layer partially positioned on one surface of the resin mask.
Obata, Katsunari. (2021). Vapor deposition mask, frame-equipped vapor deposition mask, vapor deposition mask preparation body, vapor deposition pattern forming method, method for producing organic semiconductor element, and method for producing organic el display (U.S. Patent No. 10982316). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10982316
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile