The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 20, 2021

Filed:

Mar. 23, 2015
Applicant:

Ionics France, Hérouville-Saint-Clair, FR;

Inventors:

Denis Busardo, Gonneville-sur-Mer, FR;

Frederic Guernalec, Liffre, FR;

Assignee:

IONICS FRANCE, Hérouville-Saint-Clair, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/48 (2006.01); C23C 14/00 (2006.01); C30B 33/04 (2006.01); G02B 1/12 (2006.01); G02B 1/113 (2015.01); G06F 3/044 (2006.01); C30B 29/20 (2006.01); G02B 1/11 (2015.01); G02B 1/02 (2006.01); C01F 7/02 (2006.01); C23C 14/58 (2006.01);
U.S. Cl.
CPC ...
C23C 14/0015 (2013.01); C01F 7/021 (2013.01); C23C 14/48 (2013.01); C30B 29/20 (2013.01); C30B 33/04 (2013.01); G02B 1/02 (2013.01); G02B 1/11 (2013.01); G02B 1/113 (2013.01); G02B 1/12 (2013.01); G06F 3/0446 (2019.05); C23C 14/5833 (2013.01); G06F 2203/04103 (2013.01);
Abstract

A treatment method of a sapphire material, said method comprising bombardment of a surface of the sapphire material, said surface facing a medium different from the sapphire material, by a single- and/or multi-charged gas ion beam so as to produce an ion implanted layer in the sapphire material, wherein the ions are selected from ions of the elements from the list consisting of helium (He), neon (Ne), argon (Ar), krypton (Kr), xenon (Xe), boron (B), carbon (C), nitrogen (N), oxygen (O), fluorine (F), silicon (Si), phosphorus (P) and sulphur (S). Use of said method to obtain a capacitive touch panel having a high transmission in the visible range.


Find Patent Forward Citations

Busardo, Denis. (2021). Single- and/or multi-charged gas ion beam treatment method for producing an anti-glare sapphire material (U.S. Patent No. 10982312). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10982312

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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