The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 20, 2021

Filed:

Jun. 14, 2019
Applicant:

Nivarox-far S.a., Le Locle, CH;

Inventors:

Alex Gandelhman, Neuchatel, CH;

Pierre Cusin, Villars-Burquin, CH;

Marco Verardo, Les Bois, CH;

Assignee:

Nivarox-FAR S.A., Le Locle, CH;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B81C 1/00 (2006.01); G04B 13/02 (2006.01); G04B 31/08 (2006.01); G04B 15/14 (2006.01); B81B 5/00 (2006.01); B81C 99/00 (2010.01); G04D 3/00 (2006.01); G04B 31/06 (2006.01);
U.S. Cl.
CPC ...
B81C 1/00619 (2013.01); B81B 5/00 (2013.01); B81C 1/00031 (2013.01); B81C 1/00103 (2013.01); B81C 99/0075 (2013.01); B81C 99/0085 (2013.01); G04B 13/02 (2013.01); G04B 13/022 (2013.01); G04B 13/026 (2013.01); G04B 13/027 (2013.01); G04B 15/14 (2013.01); G04B 31/06 (2013.01); G04B 31/08 (2013.01); G04D 3/0069 (2013.01); B81B 2201/035 (2013.01); B81C 2201/0132 (2013.01); B81C 2201/115 (2013.01);
Abstract

A system including two components intended to be in friction contact with each other in a given direction, wherein the friction occurs in a functional area, wherein the system is at least one of the two components including, on a surface in the functional area, a texture formed of a series of troughs of rounded shape separated by peaks or a series of bumps of rounded shape separated by troughs, the troughs extending parallel in the given direction and allowing for the evacuation of debris produced by friction and serving as a reservoir for a lubricant. A method for manufacturing at least one component or a mold by the DRIE (deep reactive ion etching) process, wherein surface defects on the sidewalls machined by the DRIE process are used to form the troughs.


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