The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 13, 2021

Filed:

Jun. 02, 2015
Applicant:

Fuji Corporation, Chiryu, JP;

Inventors:

Akihiro Niwa, Anjo, JP;

Takahiro Jindo, Anjo, JP;

Assignee:

FUJI CORPORATION, Chiryu, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H05H 1/26 (2006.01); H05H 1/46 (2006.01); C23C 16/513 (2006.01); G03F 7/42 (2006.01); H01J 37/32 (2006.01); H01L 21/67 (2006.01); H05H 1/34 (2006.01);
U.S. Cl.
CPC ...
H05H 1/26 (2013.01); C23C 16/513 (2013.01); G03F 7/427 (2013.01); H01J 37/3244 (2013.01); H01J 37/32458 (2013.01); H01J 37/32532 (2013.01); H01J 37/32825 (2013.01); H01L 21/67109 (2013.01); H05H 1/46 (2013.01); H05H 2001/3484 (2013.01); H05H 2001/4675 (2013.01); H05H 2240/10 (2013.01);
Abstract

An atmospheric pressure plasma generating device includes a nozzle block in which fourth gas passages from which plasma gas is emitted are formed, is covered by cover, and a through-hole is formed in the cover such that the leading end of the fourth gas passage is positioned on the inside. Heated gas is supplied inside the cover and is emitted from the through-hole of the cover, and plasma gas is emitted so as to penetrate the heated gas. By the plasma gas being surrounded by the heated gas in this manner, deactivation of the plasma gas is prevented. A distance between the leading end of the fourth gas passage and an opening of the through-hole at an outer wall of the cover is set from 0 to 2 mm in an emission direction of the plasma gas.


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