The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 13, 2021
Filed:
Aug. 05, 2019
Kabushiki Kaisha Toshiba, Minato-ku, JP;
Mitsuo Sano, Yokohama, JP;
Keiichiro Matsuo, Yokohama, JP;
Susumu Obata, Yokohama, JP;
Kazuhito Higuchi, Yokohama, JP;
Kazuo Shimokawa, Yokohama, JP;
KABUSHIKI KAISHA TOSHIBA, Minato-ku, JP;
Abstract
According to one embodiment, in a processing system and determining method, a X-ray intensity of character X-rays generated by irradiating a catalytic layer of a noble metal formed on a surface of a substrate with X-rays is detected. In the processing system and the determining method, either the detected X-ray intensity or a parameter calculated using the X-ray intensity is obtained as a determination parameter. In the processing system and the determining method, based at least on the determination parameter, whether or not the catalytic layer has been formed into a state suitable for etching the surface of the substrate is determined.