The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 13, 2021

Filed:

Jul. 26, 2018
Applicant:

Toshiba Memory Corporation, Minato-ku, JP;

Inventors:

Satoshi Nakaoka, Yokkaichi, JP;

Tomohiko Sugita, Yokkaichi, JP;

Shinsuke Kimura, Yokkaichi, JP;

Hiroaki Ashidate, Mie, JP;

Katsuhiro Sato, Yokkaichi, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01L 21/673 (2006.01); H01L 21/677 (2006.01); B08B 3/10 (2006.01); B08B 3/08 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67057 (2013.01); H01L 21/67086 (2013.01); H01L 21/67313 (2013.01); H01L 21/67757 (2013.01); B08B 3/08 (2013.01); B08B 3/10 (2013.01); B08B 3/102 (2013.01);
Abstract

A semiconductor processing device according to an embodiment includes a processing tank configured to store a chemical therein to allow a semiconductor substrate to be immersed in the chemical. A gas supply part is provided below the semiconductor substrate accommodated in the processing tank and is configured to supply air bubbles to the chemical from below the semiconductor substrate. A chemical supply part is provided above the gas supply part and below the semiconductor substrate and is configured to discharge the chemical caused to circulate from the processing tank, towards the air bubbles appearing from the gas supply part.


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