The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 13, 2021
Filed:
May. 09, 2019
Renesas Electronics Corporation, Tokyo, JP;
Masaaki Kanazawa, Ibaraki, JP;
RENESAS ELECTRONICS CORPORATION, Tokyo, JP;
Abstract
method of manufacturing a semiconductor device capable of manufacturing a miniaturized semiconductor device is provided. The method of manufacturing a semiconductor device according to an embodiment includes the steps of: preparing a semiconductor substrate having a first surface and a second surface which is an opposite surface of the first surface; forming a hard mask having an opening on the first surface; forming a gate trench extending toward the second surface on the first surface using the hard mask as a mask; widening the width of the opening; filling the opening with an interlayer insulating film; and forming a contact hole in the interlayer insulating film by removing the hard mask.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile