The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 13, 2021

Filed:

Nov. 07, 2017
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Jeongyub Lee, Yongin-si, KR;

Changseung Lee, Yongin-si, KR;

Yongsung Kim, Suwon-si, KR;

Jaekwan Kim, Hwaseong-si, KR;

Byonggwon Song, Seoul, KR;

Sanghoon Song, Hwaseong-si, KR;

Kiyeon Yang, Seongnam-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 1/02 (2006.01); G02B 1/00 (2006.01); C23C 14/58 (2006.01); C23C 14/06 (2006.01); C23C 14/34 (2006.01); C23C 16/40 (2006.01); G02B 3/00 (2006.01); C23C 16/50 (2006.01);
U.S. Cl.
CPC ...
G02B 1/002 (2013.01); C23C 14/0617 (2013.01); C23C 14/34 (2013.01); C23C 14/5806 (2013.01); C23C 16/401 (2013.01); G02B 1/02 (2013.01); C23C 16/50 (2013.01); G02B 3/00 (2013.01); Y10T 428/24355 (2015.01); Y10T 428/24364 (2015.01);
Abstract

A meta-optical device and a method of manufacturing the same are provided. The method includes depositing a group III-V compound semiconductor on a substrate, forming an anti-oxidation layer, performing crystallization by using post annealing, removing the anti-oxidation layer, and manufacturing a meta-optical device by using patterning.


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