The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 13, 2021

Filed:

Jul. 30, 2015
Applicant:

Japan Science and Technology Agency, Kawaguchi, JP;

Inventors:

Makoto Fujita, Tokyo, JP;

Yasuhide Inokuma, Tokyo, JP;

Kentaro Yamaguchi, Sanuki, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B 7/08 (2006.01); G01N 23/20 (2018.01); G01N 23/205 (2018.01);
U.S. Cl.
CPC ...
G01N 23/20 (2013.01); G01N 23/205 (2013.01);
Abstract

The present invention is a method for analyzing diffraction data obtained using a crystal structure analysis sample, the sample comprising a single crystal of a porous compound, and a compound for which a structure is to be determined. The method comprising: a step (I) that selects a space group that is identical to a space group of the single crystal of the porous compound, or a space group that has a symmetry lower than that, to be a space group of the crystal structure analysis sample; a step (II) that determines an initial structure of the crystal structure analysis sample using diffraction data with respect to a crystal structure of the single crystal of the porous compound as initial values; and a step (III) that refines the initial structure determined.


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