The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 13, 2021
Filed:
Sep. 07, 2018
Covestro Deutschland Ag, Leverkusen, DE;
Yuguo Gai, Shanghai, CN;
Zhangyong Ming, Shanghai, CN;
Qiang Wei, Shanghai, CN;
Joachim Zechlin, Neuss, DE;
Thomas Bludowsky, Ratingen, DE;
Wolfgang Taube, Neuss, DE;
Volker Michele, Cologne, DE;
Covestro Deutschland AG, Leverkusen, DE;
Abstract
A process for quenching, in a quenching zone, a gaseous reaction mixture that includes a diisocyanate, phosgene and hydrogen chloride that is obtained in a reaction zone upstream of the quenching zone by phosgenation of a diamine in the gas phase. The process includes injecting a deposit preventing liquid in a deposit preventing zone located between the reaction zone and the quenching zone by passing the deposit preventing liquid through spray nozzles for the deposit preventing liquid at the entrance to the deposit preventing zone. Each spray nozzle for the deposit preventing liquid sprays the deposit preventing liquid (i) onto a wall segment of the deposit preventing zone that is adjacent to said spray nozzle for the deposit preventing liquid to produce a film of the deposit preventing liquid flowing along the wall, and/or (ii) to areas in a cross-sectional plane of the deposit preventing zone before the entrance to the quenching zone.