The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 13, 2021

Filed:

Dec. 16, 2019
Applicants:

Shinya Tanaka, Kanagawa, JP;

Hiroyuki Yamashita, Kanagawa, JP;

Inventors:

Shinya Tanaka, Kanagawa, JP;

Hiroyuki Yamashita, Kanagawa, JP;

Assignee:

RICOH COMPANY, LTD., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41J 2/165 (2006.01); D06B 11/00 (2006.01); B41J 2/145 (2006.01); D05C 13/00 (2006.01); D05C 11/24 (2006.01); B41J 3/407 (2006.01); D06P 5/30 (2006.01); B41J 11/00 (2006.01);
U.S. Cl.
CPC ...
B41J 2/145 (2013.01); B41J 2/16523 (2013.01); B41J 2/16526 (2013.01); B41J 3/4078 (2013.01); D05C 11/24 (2013.01); D05C 13/00 (2013.01); D06B 11/0023 (2013.01); D06P 5/30 (2013.01); B41J 2/16508 (2013.01); B41J 2/16538 (2013.01); B41J 2/16547 (2013.01); B41J 11/002 (2013.01); B41J 11/0015 (2013.01); B41J 2002/16514 (2013.01); D05D 2305/22 (2013.01);
Abstract

A liquid discharge apparatus includes a head including a nozzle plate having a plurality of nozzles lined in a row and configured to discharge a liquid, a conveyor configured to convey the liquid application target, and a liquid receptacle configured to receive the liquid discharged from the head. The conveyor defines a conveyance passage of a liquid application target to which the head applies the liquid. The liquid receptacle has an opening through which the liquid discharged from the head passes. A longitudinal direction of the opening is along a movement direction of the liquid application target. A width of the opening is greater than a width of the liquid application target in a direction orthogonal to the movement direction.


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